SOLID-STATE AMORPHIZATION BEHAVIOR IN NI ZR MULTILAYERS WITH OXYGEN CONTAMINATION/

The solid-state amorphization by the interdiffusion reaction in sputte r-deposited Ni-Zr multilayer films with oxygen contamination has been investigated by differential scanning calorimetry and X-ray diffractom etry. Through X-ray photoelectron spectroscopy analysis, it was found that the multilayer films were contaminated with oxygen during deposit ion in a low-vacuum system (10(-5) torr), and the concentration was mo dulated having the maximum in zirconium-rich regions. The kinetics of amorphization reactions has been examined by non-isothermal and isothe rmal annealing. Oxygen introduced into the sample during sample prepar ation and annealing treatments appears to affect the kinetics of the a morphization reaction associated with variation of the activation ener gy for interdiffusion in the amorphous layer and a critical thickness of the amorphous layer. The origins of abnormal behaviour in forming i ntermetallic compound as well as amorphous phase, are discussed in the context of the oxygen incorporation.