M. Lopez et al., IN-SITU GAAS PATTERNING AND SUBSEQUENT MOLECULAR-BEAM EPITAXIAL REGROWTH OF ALGAAS GAAS WIRE STRUCTURES/, JPN J A P 2, 34(8A), 1995, pp. 958-961
We report on the use of in situ electron-beam (EB) lithography, a proc
essing technique which is conducted entirely in an ultrahigh vacuum, t
o pattern GaAs substrates with mesa stripes on which AlGaAs/GaAs wire
structures are subsequently regrown by molecular-beam epitaxy. First,
a thin GaAs oxide layer is selectively formed by EB-stimulated oxidati
on in a controlled oxygen atmosphere, and then used as a mask material
to define mesa stripes by Cl-2 gas etching. Subsequently, ridge struc
tures are formed on the mesa stripes by the regrowth of a GaAs layer.
Wire structures are fabricated on the top of the ridges by the growth
of an AlGaAs/GaAs quantum well. The high quality of the resulting stru
ctures has been confirmed by cathodoluminescence measurements at 77 K.