Rh. Henderson et E. Towe, STRAIN AND CRYSTALLOGRAPHIC ORIENTATION EFFECTS ON INTERBAND OPTICAL MATRIX-ELEMENTS AND BAND-GAPS OF [11 ]-ORIENTED III-V EPILAYERS/, Journal of applied physics, 78(4), 1995, pp. 2447-2455
We report a derivation of the 4 X 4 Luttinger valence band and Bir-Pik
us strain Hamiltonians valid for any [11l]-oriented epilayers. It is s
hown that epitaxial layers grown on substrates oriented in certain of
the [11l] directions exhibit anisotropic optical transition matrix ele
ments. This anisotropy is predicted to have its maximum for the (110)
surface. For pseudomorphic epitaxial layers, calculations indicate tha
t the zone center band gap of these structures is changed due to the e
ffects of strain, with the largest changes occurring for those structu
res grown on the (111) surface. (C) 1995 American Institute of Physics
.