STRAIN AND CRYSTALLOGRAPHIC ORIENTATION EFFECTS ON INTERBAND OPTICAL MATRIX-ELEMENTS AND BAND-GAPS OF [11 ]-ORIENTED III-V EPILAYERS/

Citation
Rh. Henderson et E. Towe, STRAIN AND CRYSTALLOGRAPHIC ORIENTATION EFFECTS ON INTERBAND OPTICAL MATRIX-ELEMENTS AND BAND-GAPS OF [11 ]-ORIENTED III-V EPILAYERS/, Journal of applied physics, 78(4), 1995, pp. 2447-2455
Citations number
26
Categorie Soggetti
Physics, Applied
Journal title
ISSN journal
00218979
Volume
78
Issue
4
Year of publication
1995
Pages
2447 - 2455
Database
ISI
SICI code
0021-8979(1995)78:4<2447:SACOEO>2.0.ZU;2-D
Abstract
We report a derivation of the 4 X 4 Luttinger valence band and Bir-Pik us strain Hamiltonians valid for any [11l]-oriented epilayers. It is s hown that epitaxial layers grown on substrates oriented in certain of the [11l] directions exhibit anisotropic optical transition matrix ele ments. This anisotropy is predicted to have its maximum for the (110) surface. For pseudomorphic epitaxial layers, calculations indicate tha t the zone center band gap of these structures is changed due to the e ffects of strain, with the largest changes occurring for those structu res grown on the (111) surface. (C) 1995 American Institute of Physics .