MICROFABRICATION OF A MECHANICALLY CONTROLLABLE BREAK JUNCTION IN SILICON

Citation
C. Zhou et al., MICROFABRICATION OF A MECHANICALLY CONTROLLABLE BREAK JUNCTION IN SILICON, Applied physics letters, 67(8), 1995, pp. 1160-1162
Citations number
8
Categorie Soggetti
Physics, Applied
Journal title
ISSN journal
00036951
Volume
67
Issue
8
Year of publication
1995
Pages
1160 - 1162
Database
ISI
SICI code
0003-6951(1995)67:8<1160:MOAMCB>2.0.ZU;2-K
Abstract
We present a detailed description of the fabrication and operation at room temperature of a novel type of tunnel displacement transducer. In stead of a feedback system it relies on a large reduction factor assur ing an inherently stable device. Stability measurements in the tunnel regime infer an electrode stability within 3 pm in a 1 kHz bandwidth. In the contact regime the conductance takes on a discrete number of va lues when the constriction is reduced atom by atom. This reflects the conduction through discrete channels. (C) 1995 American Institute of P hysics.