HYDROGEN DIFFUSION AND TRAPPING IN MICRO-NANOCRYSTALLINE SILICON

Citation
L. Lusson et al., HYDROGEN DIFFUSION AND TRAPPING IN MICRO-NANOCRYSTALLINE SILICON, Journal de physique. III, 5(8), 1995, pp. 1173-1184
Citations number
14
Categorie Soggetti
Material Science","Phsycs, Fluid & Plasmas","Physics, Applied
Journal title
ISSN journal
11554320
Volume
5
Issue
8
Year of publication
1995
Pages
1173 - 1184
Database
ISI
SICI code
1155-4320(1995)5:8<1173:HDATIM>2.0.ZU;2-U
Abstract
Effusion experiments and Secondary Ion Mass Spectrometry (SIMS) profil ing are performed on post-hydrogenated (deuterated) micro-nanocrystall ized silicon films obtained by thermal annealing of amorphous sputtere d layers. The analysis of the effusion spectra and SIMS profiles allow s to evidence the existence of cavities containing molecular hydrogen, the presence of weakly bonded hydrogen in small clusters and hydrogen trapped at grain boundaries. These results are analysed with regard t o the microstructure of the crystallized layers studied by Transmissio n Electron Microscopy. This microstructure depends on the conditions o f deposition of the original amorphous layers.