MODELING OF MASS-TRANSPORT AND GAS KINETICS OF THE REACTIVE SPUTTERING PROCESS

Modeling of reactive sputter deposition processes is a very important tool for fast and inventive process development. A short review with s ome new results is given for a set of previously presented reactive sp uttering models that has been successful in describing and predicting the processes. Examples are given for each case of reactive sputtering with one target and one reactive gas, reactive compound- and co-sputt ering as well as reactive sputtering using two reactive gases. The imp ortance of process control in order to control the inherent instabilit ies and composition, is emphasized.