A. Grafov et al., STRUCTURE AND DESTRUCTION OF A PRECURSOR - MASS-SPECTROMETRIC EVALUATION OF CREATION OF FUNCTIONAL FILMS WITH PREDETERMINATED COMPOSITION, Journal de physique. IV, 5(C5), 1995, pp. 541-546
Among a variety of applications of organometallic compounds, their use
as MOCVD precursors is one of the most extensive areas. To our minds,
one of the most powerful and accurate methods for evaluation and pred
iction of thermal behaviour of the precursor is mass-spectrometry coup
led with mass-analyzed ion kinetic energy spectrometry. Traditionally,
both structure and composition of deposited materials and the precurs
or's thermal decomposition channels were controlled by gas-phase compo
sition, the process temperature and pressure, i.e. by external factors
. A possibility of such a control via inner factors - i.e. structure o
f a specially designed precursors is demonstrated for a series of new
mixed-ligand organometallic compounds of In, Zr and Hf.