ISLAND GROWTH, STRAIN, AND INTERDIFFUSION IN INAS1-XPX INP HETEROSTRUCTURES/

Citation
Dj. Tweet et al., ISLAND GROWTH, STRAIN, AND INTERDIFFUSION IN INAS1-XPX INP HETEROSTRUCTURES/, Applied physics letters, 67(9), 1995, pp. 1286-1288
Citations number
23
Categorie Soggetti
Physics, Applied
Journal title
ISSN journal
00036951
Volume
67
Issue
9
Year of publication
1995
Pages
1286 - 1288
Database
ISI
SICI code
0003-6951(1995)67:9<1286:IGSAII>2.0.ZU;2-N
Abstract
Using x-ray diffraction and transmission electron microscopy we have f ound that InAs1-xPx films deposited on InP(001) substrates with organo metallic vapor phase epitaxy grow in an unusual island growth mode cha racterized by large strain-dependent interdiffusion. Initially, strong intermixing occurs, producing pseudomorphic islands of intermediate c omposition. These grow only until some point in the relaxation process , possibly a critical value of the strain, after which islands of the intended composition begin to appear. Furthermore, both types of islan ds are found to penetrate deeply into the substrate. (C) 1995 American Institute of Physics.