Using x-ray diffraction and transmission electron microscopy we have f
ound that InAs1-xPx films deposited on InP(001) substrates with organo
metallic vapor phase epitaxy grow in an unusual island growth mode cha
racterized by large strain-dependent interdiffusion. Initially, strong
intermixing occurs, producing pseudomorphic islands of intermediate c
omposition. These grow only until some point in the relaxation process
, possibly a critical value of the strain, after which islands of the
intended composition begin to appear. Furthermore, both types of islan
ds are found to penetrate deeply into the substrate. (C) 1995 American
Institute of Physics.