Low-frequency noise characteristics of MOSFET's have been studied in t
erms of their dependence on metal interconnect perimeter length, devic
e W/L ratio, and gate-biasing voltage, In contrast to the theoretical
model, a noise intensity increasing with lowering gate biasing was obs
erved, which suggests that a compromise between noise performance and
gain/offset voltage needs to be carefully examined in analog circuit d
esign, Low-frequency noise was also found to be dependent on W/L ratio
in devices with the same gate area, which should be considered in fut
ure device scaling.