A self-aligned process for the fabrication of SiGe p-type modulation-d
oped field-effect transistors (MODFET's) is described, Self-aligned de
vices with 0.1-mu m gate-length have been fabricated and characterized
, A maximum de extrinsic transconductance of 258 mS/mm was obtained wi
th a low turn-on resistance and very low knee voltage, Excellent high
frequency performance with a unity current-gain cutoff frequency (f(T)
) of 70 GHz was obtained, This excellent high frequency performance wa
s exhibited even at drain bias as low as 0.5 V.