The characteristics of heterojunction diodes fabricated from p-type ep
itaxial Si0.07Ge0.91Co0.02 alloy grown by molecular beam epitaxy on n-
type Si (100) have been examined by using current-voltage, capacitance
-voltage, and Hall effect measurements, The SiGeC/Si heterojunction di
ode shows good rectification with nearly ideal forward bias behavior a
nd low reverse leakage currents compared to Ge/Si heterojunction diode
s, The temperature dependence of the current-voltage behavior indicate
s that the principle conduction mechanism is by electron injection ove
r a barrier, Reverse breakdown occurs by the avalanche mechanism.