InP epitaxial layers grown by gas-source molecular beam epitaxy on (10
0) GaAs substrates were characterized using three-beam multiple X-ray
diffraction. The mosaic spread along the [0 $($) over bar$$ 11] and [0
1 $$($) over bar 1] directions and the in-plane epilayer lattice param
eter are determined from computer simulations. The effects of nucleati
on temperature, buffer layer type and post-growth annealing and substr
ate misorientation are studied.