DEPOSITION AND PROPERTIES OF THIN PECVD CARBON-FILMS AFTER RAPID THERMAL ANNEALING

Authors
BESHKOV G DIMITROV D GEORGIEV S DIMITROVA T
Citation
G. Beshkov et al., DEPOSITION AND PROPERTIES OF THIN PECVD CARBON-FILMS AFTER RAPID THERMAL ANNEALING, Journal de physique. IV, 5(C5), 1995, pp. 615-619
Citations number
10
Categorie Soggetti
Physics
Journal title
Journal de physique. IV → ACNP
ISSN journal
11554339
Volume
5
Issue
C5
Year of publication
1995
Part
2
Pages
615 - 619
Database
ISI
SICI code
1155-4339(1995)5:C5<615:DAPOTP>2.0.ZU;2-A
Abstract
In this work the properties of PECVD-carbon films before and after Rap id Thermal Annealing (RTA) are presented. The thickness of the investi gated films is in the range 50 - 6000 Angstrom. The layers are anneale d at 1400 degrees C for different times of 1 s to 3 min in vacuum 5 x 10-(5)Torr. Raman investigation has been performed before and after an nealing.