DIRECT DEPOSITION OF METAL-FILM PATTERNS USING NITROGEN LASER

Rhenium, gold and platinum film micropatterns were obtained by the LCV D method on the surface of silicon and glass substrates from vapors of Re-2(CO)(10), (CH3)(2)Au(dpm). Pt(hfa)(2), respectively. The heated r eaction chamber at atmospheric pressure with a flow of an inert gas-ca rrier was used. The high marginal sharpness and the thickness uniformi ty of deposited films was provided by the use of a powerful nanosecond pulse nitrogen laser (lambda=337 nm), a projective system for delinea tion of the irradiation zone and by laser beam microscanning in the li mits of the projective mask window. The metal pattern replicating the configuration of the projective mask window with a uniform 0.1-1 mu m thickness was formed during 1-10 s. The writing rate of the straight m etal lines was limited by the size of the irradiation zone and by the pulse repetition frequency and made of 150 mu m/s. The smooth Re films were obtained with a good adhesion to the substrate and a surface res istivity of about 1 Omega/square. The films of Au and Pt were deposite d as layers of microdrops whose coupling with one another and with the contact ground determined the film resistivity. The melting of Au and Pt films occurs during the laser-induced deposition process and influ ences the film growth dynamics and the film-to-substrate adhesion.