THE STUDY OF THE BORON-NITRIDE THIN-LAYER STRUCTURE

The structure of thin layers of boron nitride obtained by low temperat ure plasma enhanced chemical vapour deposition of borazine as precurso r has been investigated by X-ray diffraction method. The diffraction p attern consists of the superposition of the three patterns: from non-c rystalline turbostrate am-BN, from polycrystalline h-BN and c-BN. The sizes of intermolecular (nucleus surrounded by ''fringe''), 14.8 Angst rom, and intramolecular (nucleus), 7.6 Angstrom, formations are evalua ted from the reflection positions in non-crystalline stare and confirm ed by calculation. Polycrystalline reflections from h-BN and c-BN are in accordance with known ones for these modifications.