A. Sassella et al., OPTICAL-PROPERTIES OF CVD-DEPOSITED DIELECTRIC FILMS FOR MICROELECTRONIC DEVICES, Journal de physique. IV, 5(C5), 1995, pp. 843-859
Optical characterization of dielectric films used in integrated circui
t device manufacturing can give information on their optical behavior
as well as on their structural properties and composition. The results
obtained on several undoped and doped silicon oxides, silicon oxynitr
ides, and silicon nitrides usually employed for microelectronic applic
ations both in the ultraviolet-visible and infrared spectral ranges ar
e illustrated.