CHEMICAL-VAPOR-DEPOSITION FOR OPTICAL-FIBER TECHNOLOGY

Authors
Citation
L. Cognolato, CHEMICAL-VAPOR-DEPOSITION FOR OPTICAL-FIBER TECHNOLOGY, Journal de physique. IV, 5(C5), 1995, pp. 975-987
Citations number
28
Categorie Soggetti
Physics
Journal title
ISSN journal
11554339
Volume
5
Issue
C5
Year of publication
1995
Part
2
Pages
975 - 987
Database
ISI
SICI code
1155-4339(1995)5:C5<975:CFOT>2.0.ZU;2-S
Abstract
At the beginning of the seventies, a break-through took place in the t elecommunication research. The introduction of Chemical Vapour Deposit ion technology in the manufacture of optical fibres allowed both techn ical quality and economical convenience to realise optical networks, t hus beginning the telecommunication revolution. Since that moment, a g reat development of the CVD techniques has been performed, introducing several methods to produce fibres with geometry and optical propertie s optimised for different applications. An overview of the different m ethods is given, and the problems which have been to be solved in thes e years are described.