EVOLUTION OF MAGNETOMECHANICAL AND MAGNETIC-PROPERTIES OF SILICONIZEDIRON-SILICON ALLOYS BY CVD PROCESS USING SICL4

Non-oriented and grain-oriented 6.5% Si-Fe laminations have been prepa red by means of the dynamic Chemical Vapour Deposition technique, expl oiting a chemical reaction at 1000 degrees C between a flowing SiCl4 Ar mixture and an iron-silicon based substrate. The siliconizing proc ess leads, from the first moments, to an epitaxial growth of Fe3Si, th en to an underlayer solid solution by intermetallic diffusion. The opt imum treatment has been chosen as 60 minutes at 1000 degrees C, follow ed by 13 hour annealing in vacuum at the same temperature, which permi ts one to achieve the desired uniform concentration of Si around 6.5 w t %. NO and GO treated samples have been magnetically characterized in the frequency range 0.5 Hz - 1 kHz. A decrease between 15% and 50% of the energy loss has been observed in the CVD laminations.