PHYSICAL-PROPERTIES OF GALLIUM INDIUM NITRIDE FILMS PREPARED BY PHOTO-ASSISTED MOVPE

Citation
T. Nagatomo et O. Omoto, PHYSICAL-PROPERTIES OF GALLIUM INDIUM NITRIDE FILMS PREPARED BY PHOTO-ASSISTED MOVPE, Journal de physique. IV, 5(C5), 1995, pp. 1173-1178
Citations number
11
Categorie Soggetti
Physics
Journal title
ISSN journal
11554339
Volume
5
Issue
C5
Year of publication
1995
Part
2
Pages
1173 - 1178
Database
ISI
SICI code
1155-4339(1995)5:C5<1173:POGINF>2.0.ZU;2-T
Abstract
The optical and electrical properties, crystallinity, and photolumines cence of GaInN epitaxial films were remarkably improved by photo-assit ed MOVPE using ultraviolet (UV) light from a deuterium (D-2) lamp. Til e dissociation of NH3 is promoted by irradiation with a D-2 lamp aid i ndium atoms are effectively incorporated into the crystal lattice of G aInN. Good-quality epitaxial GaInN films were obtained at higher growt h temperature of 800 degrees C increasing the flow rate of trimethylin dium (TMIn). The photoluminescence peak intensity (band-edge emission) of GaInN films grown at 800 degrees C is 14 times as great as that of 675 degrees C.