A volatile molybdenyl complex of formula MoO2(dpm)(2) has been studied
as a precursor for MOCVD of MoO3 films. Qualitative indications on th
e possible decomposition path were obtained by mass spectrometry and t
hermal analysis. Good quality films were deposited using Pt and Si(100
) as substrates. The films were characterised by X-ray photoelectron s
pectroscopy (XPS), X-ray diffraction (XRD), scanning electron microsco
py (SEM), IR and UV-VIS spectroscopies.