INITIAL-STAGE OF AG GROWTH ON SI(001) STUDIED BY HIGH-RESOLUTION RUTHERFORD-BACKSCATTERING SPECTROSCOPY

The initial stage of Ag growth on the Si(001)2X1 surface is observed a t 520 and 760 K by monolayer-resolvable high-resolution Rutherford-bac kscattering spectroscopy. At 760 K, the coverage of Ag saturates at 0. 5 ML. (1 ML =6.78X10(14) atoms/cm(2)) after formation of a two-dimensi onal Ag layer. The position of the Ag atom is determined from observed inelastic energy losses of He ions scattered from the Ag atoms. The g rowth mode at 520 K is found to be the Stranski-Krastanov mode with a critical thickness of 0.5 ML for the initial layer growth.