The effect of strain on the cation interdiffusion in InGaAs/GaAs quant
um wells is described. It is found that the Fick's diffusion equation
does not properly describe the interdiffusion in the heterostructure w
ith strained layers. It is believed that the strain changes crystal de
fect concentration and thus diffusivity is influenced by strain. Diffu
sion equation including the strain effect is formulated and solved num
erically. The experimental photoluminescence peak shifts as a function
of annealing time are well-fitted by this analysis and useful paramet
ers such as diffusivity describing InGaAs/GaAs quantum well interdiffu
sion are extracted. (C) 1995 American Institute of Physics.