FABRICATION OF LARGE ARRAYS OF METALLIC NANOWIRES ON V-GROOVED SUBSTRATES

Large arrays of Au nanowires down to 50 nm in width are fabricated on V-grooved InP substrates. Holographic laser interference exposure of p hotoresist and anisotropic etching are used to pattern the surface of InP(001) substrates into V-shaped grooves with a 200 nm period. Next, the patterned substrates are covered with a thin Au film, which is sub sequently structured into nanowires using a well controlled wet etchin g process. Initial characterization confirms that the wires are electr ically continuous. (C) 1995 American Institute of Physics.