The fringe contrast observed in a copper film with its Cu[110] paralle
l to the incident electron beam has been investigated by high-resoluti
on electron microscopy (HREM). According to a geometrical analysis for
these fringes, it was assumed that they originated from the Cu-O chai
ns adsorbed on a Cu(110) surface. This assumption was confirmed by a m
ultislice image simulation on the basis of the electron diffraction an
d imaging theory using an added-row reconstruction model. Our calculat
ion indicates that an added-Cu-O-chain surface reconstruction can gene
rate a regular fringe pattern with sufficient contrast in a thin coppe
r film with a thickness of several nanometers. The present study demon
strates the potential of HREM to investigate surface structures and su
rface reaction of ultrathin films at the atomic level.