LOW-TEMPERATURE CRYSTALLIZATION OF SPUTTERED CARBON-FILMS

The crystallization of amorphous carbon films, under inert atmospheres , occurs at annealing temperatures above 800 degrees C. In this work w e have found that when the annealing of carbon films is performed unde r atmospheric conditions, crystallization occurs at temperatures as lo w as 200 degrees C. The catalytic effect of oxygen in the crystallizat ion process is understood in terms of the generation of a porous struc ture in the carbon film due to the vaporization of carbon oxides. (C) 1995 American Institute of Physics.