CHALLENGES FOR PREDICTIVE PROCESS SIMULATION IN SUB 0.1 MU-M SILICON DEVICES

The promise of process simulation has always been that it could replac e costly experiments in the development of new technology. The reality has been far less, primarily because of deficiencies in the physical models underlying such simulations. This situation is changing rapidly however, as better physically based models are developed. This paper describes recent progress in developing physically based process simul ators like SUPREM. A number of examples will be shown which will illus trate the growing predictive power of such TCAD tools, even for silico n structures well beyond current manufacturing practice.