THE ROLE OF HYDROGEN DURING PLASMA BEAM DEPOSITION OF AMORPHOUS THIN-FILMS

The influence of wall-associated H-2 molecules and other hydrogen-cont aining monomers on the degree of ionization in the expanding thermal p lasma used for the fast plasma beam deposition of amorphous hydrogenat ed carbon (a-C:H) and amorphous hydrogenated silicon (a-Si:H) was dete rmined. Deposition models are discussed with emphasis on the specific role of the ion during deposition. The connection between the role of atomic hydrogen and the degree of ionization in the plasma beam deposi tion of a-C:H and a-Si:H is addressed.