The use of plasma and ion technologies in industrial applications is r
apidly increasing. Plasma techniques make possible or enhance PVD and
CVD processes. They present new means for surface and subsurface modif
ications. In many cases, they provide new, environmentally compatible
solutions for old problems. New processes and equipment are available
which are suitable for industrial exploitation. A few examples will il
lustrate this. Duplex coatings combining a nitriding treatment and ion
plated thin films on tools and machine parts boost their performance
in many applications. Diamond films for various applications are depos
ited by plasma techniques. Metal containing diamond-like carbon films
improve the wear performance of tribological systems. Surface can be c
leaned without the use of any solvents. Plastics can be conditioned to
provide good adhesion for paints and glues. New equipment is availabl
e for the deposition of films for flat panel displays. Plasma impulse
CVD is used for the production of optical thin films.