NUMERICAL SIMULATIONS OF MICROWAVE PLASMA REACTORS FOR DIAMOND CVD

A model has been developed simulating electromagnetic fields and plasm a densities of reactors for microwave plasma assisted chemical vapour deposition. Computer programs calculate alternately the electric field for a given spatial distribution of the plasma and the plasma for a g iven distribution of the electric field. This procedure converges towa rds a self-consistent solution of the microwave field-plasma system de scribed by parameters such as collision frequency, electric breakdown and maintenance held strength and an adjustable parameter gamma relati ng electric field strength and plasma density. One key feature of the simulation is the straightforward possibility to model reactors with s patially varying dielectric properties. The calculations are successfu lly applied to simulate (i) a linear plasma system, where the plasma c oaxially surrounds a quartz tube, and (ii) the TM01 mode reactor widel y used in diamond CVD.