SIO2 COATINGS PRODUCED BY ION-BEAM-ASSISTED ECR-PLASMA CVD

Ion beam assisted electron cyclotron resonance plasma CVD (IB-PCVD) eq uipment was developed. Plasma was produced by a coaxial ECR discharge. A bucket-type ion source with a microwave plasma (MP) cathode was use d as an ion source. Amorphous SiO2 films were deposited on austenitic- type stainless steel and silicon wafer substrates by use of the IB-PCV D equipment. The effects of the gas flow of monosilane, carbon dioxide and hydrogen and oxygen ion energies have been studied in the relatio n to composition, structure, corrosion properties and oxidation protec tion potential of the films. The surface morphology was observed by sc anning electron microscopy. Auger spectroscopy, X-ray photoelectron sp ectroscopy and Fourier transform IR were used to characterize films an d interface. The corrosion protection potential in an aqueous environm ent was evaluated by electrochemical techniques. Oxidation behaviour i n the atmosphere in an oven was studied at 1000 degrees C. Surfaces of the films were smooth, and grain structure was not dear. These films had good corrosion protection. Oxidation of steel substrate was suppre ssed by the SiO2 coating. Oxygen irradiation during deposition was eff ective to improve corrosion and oxidation protection.