DEPOSITION OF A-SI-H FILMS BY ECR PLASMA CVD USING LARGE-DIAMETER MULTI-SLOT ANTENNAE

Authors
UEDA Y TERANISHI H TANAKA M SHINOHARA S KAWAI Y
Citation
Y. Ueda et al., DEPOSITION OF A-SI-H FILMS BY ECR PLASMA CVD USING LARGE-DIAMETER MULTI-SLOT ANTENNAE, Surface & coatings technology, 74-5(1-3), 1995, pp. 503-507
Citations number
9
Categorie Soggetti
Materials Science, Coatings & Films
Journal title
Surface & coatings technology → ACNP
ISSN journal
02578972
Volume
74-5
Issue
1-3
Year of publication
1995
Pages
503 - 507
Database
ISI
SICI code
0257-8972(1995)74-5:1-3<503:DOAFBE>2.0.ZU;2-T
Abstract
A large diameter electron cyclotron resonance plasma was produced with a multi-slot antenna. The radial profile of the ion saturation curren t was examined as a function of input microwave power, gas pressure an d magnetic mirror coil current to determine the experimental condition s necessary for a large diameter and uniform plasma at low pressure. F urthermore, the deposition of a-Si:H films was attempted onto 8 inch g lass substrates using a gas mixture SiH4-10% He.