De. Jesson et al., SURFACE STRESS, MORPHOLOGICAL DEVELOPMENT, AND DISLOCATION NUCLEATIONDURING SIXGE1-X EPITAXY, Scanning microscopy, 8(4), 1994, pp. 849-857
Utilizing Ge marker layer experiments combined with atomic number cont
rast (Z-contrast) imaging, we have studied the evolving surface morpho
logy of SixGe1-x alloys during growth by molecular beam epitaxy. The m
arker layers map out the instability transition between planar two-dim
ensional (2D) growth and three-dimensional (3D) growth. The transition
occurs via the gradual formation of a surface ripple as anticipated f
rom instability theory. However, these undulations rapidly develop int
o crack-like surface instabilities which we simulate and explain by th
e mechanism of stress-driven surface diffusion. Finally, we model the
large stresses associated with these features within a fracture mechan
ics formalism. This analysis demonstrates that crack-like instabilitie
s provide ideal candidate sites for the nucleation of misfit dislocati
ons.