AN X-RAY PHOTOELECTRON-SPECTROSCOPY STUDY OF THE SURFACE-COMPOSITION OF COXFE80-XSI10B10 METALLIC GLASSES

Citation
A. Glisenti et al., AN X-RAY PHOTOELECTRON-SPECTROSCOPY STUDY OF THE SURFACE-COMPOSITION OF COXFE80-XSI10B10 METALLIC GLASSES, Journal of alloys and compounds, 226(1-2), 1995, pp. 213-221
Citations number
16
Categorie Soggetti
Chemistry Physical","Metallurgy & Metallurigical Engineering","Material Science
ISSN journal
09258388
Volume
226
Issue
1-2
Year of publication
1995
Pages
213 - 221
Database
ISI
SICI code
0925-8388(1995)226:1-2<213:AXPSOT>2.0.ZU;2-A
Abstract
X-ray photoelectron spectroscopy (XPS) was used to analyze native oxid e films at the surfaces of amorphous ribbons of CoxFe80-xSi10B10 (x = 0, 15, 70, 80). The oxide layer differs in thickness and composition f or the different samples, but no difference in thickness is detected f or the shiny and dull sides of each ribbon, even if different chemical compositions are found. A large surface segregation of silicon is obs erved for the whole set of compositions. Boron has a qualitatively sim ilar but quantitatively less pronounced surface segregation. Iron oxid es are also included in the passive films while cobalt, strongly deple ted at the surface, is present mainly in the non-oxidized form. XPS da ta were compared with the results of corrosion tests obtained by immer sion of the ribbons in acidic solutions of different pH.