M. Zeuner et al., OXIDATIVE DECOMPOSITION OF POLYMETHYLMETHACRYLATE (PMMA) IN PLASMA-ETCHING, Plasma sources science & technology, 4(3), 1995, pp. 406-415
Investigations on the plasma chemical oxidation process of polymethylm
ethacrylate have been performed in a parallel-plate RF discharge. Oxyg
en radicals are shown to be the chemical species that is essential for
oxidative etching. ion bombardment of the polymer surface is characte
rized as the energetically dominant activation mechanism. Based on a m
acroscopic point of view taking only the stable reactants into account
and an exact quantitative balance of all initial substances and react
ion products, it is demonstrated that elementary rules of chemistry, s
uch as stoichiometric substance conversion and a modified mass action
law, are also valid in plasma chemical processes. By means of these fu
ndamental laws, the composition of stable gases in the reactor and the
effectiveness of the process are explained.