METASTABLE ASSISTED DEPOSITION OF TIN FILMS

Citation
H. Barankova et al., METASTABLE ASSISTED DEPOSITION OF TIN FILMS, Applied physics letters, 67(11), 1995, pp. 1521-1523
Citations number
12
Categorie Soggetti
Physics, Applied
Journal title
ISSN journal
00036951
Volume
67
Issue
11
Year of publication
1995
Pages
1521 - 1523
Database
ISI
SICI code
0003-6951(1995)67:11<1521:MADOTF>2.0.ZU;2-0
Abstract
An excess heat from an exothermic reaction of metastable Ar (4(3)P(0)) and Ar (4(3)P(2)) atoms with N-2 molecules at low contents of N-2 in Ar was found to be responsible for an enhanced thermionic emission, an enhanced production of Ti target vapor, an increased ionization, and consequently for an enhanced deposition rate of TiN films in the radio frequency hollow cathode plasma jet (RHCPJ). This finding emphasizes favorable geometry of hollow cathodes, as well as an important role of metastables in plasma-assisted processes. (C) 1995 American Institute of Physics.