Bm. Hausen et al., THE ALLERGENS OF NAIL POLISH .1. ALLERGENIC CONSTITUENTS OF COMMON NAIL POLISH AND TOLUENESULFONAMIDE-FORMALDEHYDE RESIN (TS-F-R), Contact dermatitis, 33(3), 1995, pp. 157-164
Nail polish that has completely dried on the fingernails contains wate
r-soluble components that attain the skin during extensive but transie
nt contact. This was proven by water extraction of thin layers of nail
polish that had been painted onto glass plates and allowed to dry for
3 days. Comparing the isolated fractions and compounds with known nai
l polish ingredients revealed that the water-soluble substances are pa
ra- and ortho-toluenesulfonamide, dibutyl phthalate and 3 constituents
of toluenesulfonamide-formaldehyde resin (TS-F-R), which is the basic
material of almost all nail polishes sold worldwide. 12 female patien
ts with proven nail polish allergy were patch tested with 21 nail poli
sh components, including those isolated. Only 2 fractions were positiv
e. These contained a monomer and a dimer created during condensation o
f TS-F-R. Their structures were elucidated. The 3rd compound, a trimer
, remained negative, except in 1 case.