THE ALLERGENS OF NAIL POLISH .1. ALLERGENIC CONSTITUENTS OF COMMON NAIL POLISH AND TOLUENESULFONAMIDE-FORMALDEHYDE RESIN (TS-F-R)

Citation
Bm. Hausen et al., THE ALLERGENS OF NAIL POLISH .1. ALLERGENIC CONSTITUENTS OF COMMON NAIL POLISH AND TOLUENESULFONAMIDE-FORMALDEHYDE RESIN (TS-F-R), Contact dermatitis, 33(3), 1995, pp. 157-164
Citations number
55
Categorie Soggetti
Allergy,"Dermatology & Venereal Diseases
Journal title
ISSN journal
01051873
Volume
33
Issue
3
Year of publication
1995
Pages
157 - 164
Database
ISI
SICI code
0105-1873(1995)33:3<157:TAONP.>2.0.ZU;2-7
Abstract
Nail polish that has completely dried on the fingernails contains wate r-soluble components that attain the skin during extensive but transie nt contact. This was proven by water extraction of thin layers of nail polish that had been painted onto glass plates and allowed to dry for 3 days. Comparing the isolated fractions and compounds with known nai l polish ingredients revealed that the water-soluble substances are pa ra- and ortho-toluenesulfonamide, dibutyl phthalate and 3 constituents of toluenesulfonamide-formaldehyde resin (TS-F-R), which is the basic material of almost all nail polishes sold worldwide. 12 female patien ts with proven nail polish allergy were patch tested with 21 nail poli sh components, including those isolated. Only 2 fractions were positiv e. These contained a monomer and a dimer created during condensation o f TS-F-R. Their structures were elucidated. The 3rd compound, a trimer , remained negative, except in 1 case.