SURFACE X-RAY-DIFFRACTION STUDY ON THE SI(001)2X1 STRUCTURE

Citation
M. Takahasi et al., SURFACE X-RAY-DIFFRACTION STUDY ON THE SI(001)2X1 STRUCTURE, Surface science, 338(1-3), 1995, pp. 846-850
Citations number
27
Categorie Soggetti
Chemistry Physical
Journal title
ISSN journal
00396028
Volume
338
Issue
1-3
Year of publication
1995
Pages
846 - 850
Database
ISI
SICI code
0039-6028(1995)338:1-3<846:SXSOTS>2.0.ZU;2-U
Abstract
The atomic structure of the Si(001)2 x 1 clean surface has been invest igated by surface X-ray diffraction technique. Its sensitivity to both in-plane and out-of-plane directions has allowed three-dimensional an alysis of the atomic arrangement. The least squares fitting has given the asymmetric dimers whose bond length is 2.37 +/- 0.06 Angstrom and buckling angle is 20 +/- 3 degrees with the strain of the substrate ov er six layers. The resultant structure is similar to that of the Ge(00 1)2 x 1 surface.