The reaction of both porous silicon and hydrogen covered (passivated)
porous silicon with methanol was investigated. Adsorption of methanol
onto porous silicon at 300 K resulted in cleavage of the O-H bond and
formation of Si-OCH3 and Si-H surface species. Heating of these surfac
e species to similar to 500 K caused breakage of both the C-O and C-H
bonds. This resulted in the formation of Si-H surface species and the
incorporation of oxygen and carbon into the porous silicon layer. Atte
mpts to adsorb methanol onto passivated porous silicon proved unsucces
sful until removal of the Si-H surface species commenced at 600 K. In
addition to oxygen and carbon incorporation, Si-OCH3, Si-CH3, and Si-H
surface species were observed when excess CH3OH(g) was used to drive
the decomposition reaction. The stability of the Si-CH3 species when e
xcess CH3OH(g) was present is likely due to oxygen and/or carbon passi
vation of the silicon surface.