THE STRUCTURE AND THERMAL-BEHAVIOR OF CU ON ULTRATHIN FILMS OF SIO2 ON SI(111)

Authors
ZHOU JB GUSTAFSSON T GARFUNKEL E
Citation
Jb. Zhou et al., THE STRUCTURE AND THERMAL-BEHAVIOR OF CU ON ULTRATHIN FILMS OF SIO2 ON SI(111), Surface science, 372(1-3), 1997, pp. 21-27
Citations number
14
Categorie Soggetti
Chemistry Physical
Journal title
Surface science → ACNP
ISSN journal
00396028
Volume
372
Issue
1-3
Year of publication
1997
Pages
21 - 27
Database
ISI
SICI code
0039-6028(1997)372:1-3<21:TSATOC>2.0.ZU;2-1
Abstract
A study of the structure of thin Cu coatings on ultrathin SiO2 films g rown on Si(111) is reported. Cu growth takes place in islands, and aft er annealing to 625 K or above, the Cu overlayer diffuses into the sub strate. These results are similar to recently reported results for Ni overlayers. Unlike Ni, however, the Cu atoms occupy interstitial sites in the Si lattice.