We have measured the dielectric functions of three Si1-yCy alloy layer
s (y less than or equal to 1.4%) grown pseudomorphically on Si (001) s
ubstrates using molecular beam epitaxy at low temperatures. From the n
umerical derivatives of the measured spectra, we determine the critica
l point energies E(0)' and E(1) as a function of y (y less than or equ
al to 1.4%) using a comparison with analytical line shapes and analyze
these energies in terms of the expected shifts and splittings due to
negative pressure, shear stress, and alloying. Our data agree well wit
h the calculated shifts for E(1), but the E(0)' energies are lower tha
n expected.