FDM WDM COUPLERS USING SILICA WAVE-GUIDE DEPOSITED BY APCVD/

Citation
T. Hanada et al., FDM WDM COUPLERS USING SILICA WAVE-GUIDE DEPOSITED BY APCVD/, IEICE transactions on electronics, E80C(1), 1997, pp. 130-133
Citations number
2
Categorie Soggetti
Engineering, Eletrical & Electronic
ISSN journal
09168524
Volume
E80C
Issue
1
Year of publication
1997
Pages
130 - 133
Database
ISI
SICI code
0916-8524(1997)E80C:1<130:FWCUSW>2.0.ZU;2-U
Abstract
We describe the design, fabrication, and characteristics of FDM/WDM co upler deposited by TEOS-O-3 based APCVD method on silicon substrates. Due to drastically reduced birefringence by APCVD process, completely polarization independent narrow band (100 GHz) Mach-Zehnder type FDM c oupler was obtained. We also fabricated 1.3/1.55 mu m directional coup ler type WDM coupler with very low insertion loss.