O. Parriaux et al., SPATIAL-FREQUENCY BANDWIDTH IN THE PHOTOLITHOGRAPHIC TRANSFER OF SUBMICRON GRATINGS, Optical engineering, 34(9), 1995, pp. 2657-2659
The principle of the photolithographic mask transfer of high-spatial-f
requency gratings under the Littrow angle is shown to be so tolerant t
hat a broad spatial-frequency spectrum can be transferred under the sa
me exposure conditions.