USING CONVENTIONAL PHOTOLITHOGRAPHIC GLASS MASKS AS HIGH-EFFICIENCY PHASE GRATINGS

Authors
VOIRIN G PARRIAUX O VUILLIOMENET H WILDI R BENNER U SCHNEIDER SMOL
Citation
G. Voirin et al., USING CONVENTIONAL PHOTOLITHOGRAPHIC GLASS MASKS AS HIGH-EFFICIENCY PHASE GRATINGS, Optical engineering, 34(9), 1995, pp. 2687-2690
Citations number
3
Categorie Soggetti
Optics
Journal title
Optical engineering → ACNP
ISSN journal
00913286
Volume
34
Issue
9
Year of publication
1995
Pages
2687 - 2690
Database
ISI
SICI code
0091-3286(1995)34:9<2687:UCPGMA>2.0.ZU;2-D
Abstract
By patterning the iron oxide film of a conventional iron oxide mask it is possible to obtain a binary phase grating of high diffraction effi ciency and high transmission that can be used in high-resolution displ acement sensors.