G. Faraci et al., AL INTERMEDIATE OXIDATION-STATES OBSERVED BY CORE-LEVEL PHOTOEMISSIONSPECTROSCOPY, Journal of applied physics, 78(6), 1995, pp. 4091-4098
Aluminum oxidation states in stoichiometric or substoichiometric confi
guration are studied by core level photoemission spectroscopy on diffe
rent substrates (SiO2, graphite). They are compared with recent result
s reported for the interface Si-Al-n+O. Three Al oxidation states have
been identified and their space distribution (binding energy, intensi
ty, and width) is determined in the region from the interface with the
substrate up to the surface of a thick overlayer. The Al-2+O-- interm
ediate oxidation state is shown to be confined at the interface; on th
e contrary, the Al1+-O oxidation state and the stoichiometric oxide (a
lumina) are present beyond the interface region. From the attenuation
of the substrate core level peak, the deposition morphology and the at
tenuation length of the photoelectrons have been deduced. (C) 1995 Ame
rican Institute of Physics.