LINEAR ARC-DISCHARGE SOURCE FOR LARGE-AREA PLASMA PROCESSING

Citation
L. Bardos et al., LINEAR ARC-DISCHARGE SOURCE FOR LARGE-AREA PLASMA PROCESSING, Applied physics letters, 70(5), 1997, pp. 577-579
Citations number
16
Categorie Soggetti
Physics, Applied
Journal title
ISSN journal
00036951
Volume
70
Issue
5
Year of publication
1997
Pages
577 - 579
Database
ISI
SICI code
0003-6951(1997)70:5<577:LASFLP>2.0.ZU;2-9
Abstract
A linearly scalable plasma source based on the radio frequency generat ed hot hollow cathode discharge between two parallel plates with a mag netic field perpendicular to the plates near the outlet of the cathode is introduced. The magnetic field facilitates and confines the hollow cathode discharge which leads to a high power density and a high cath ode wall temperature. The geometry and location of hot zones is direct ly controlled by magnetic field. The linear are discharge (LAD) source exhibits similar features as the cylindrical radio frequency hollow c athode plasma jet. Experiments indicate a metastable assisted growth o f TIN films. LAD source extends abilities of the radio frequency hollo w cathode plasma jet to the large area processing. (C) 1997 American I nstitute of Physics.