SELECTIVE CHEMICAL ETCHING OF HEXAGONAL BORON-NITRIDE COMPARED TO CUBIC BORON-NITRIDE

Authors
HARRIS SJ WEINER AM DOLL GL MENG WJ
Citation
Sj. Harris et al., SELECTIVE CHEMICAL ETCHING OF HEXAGONAL BORON-NITRIDE COMPARED TO CUBIC BORON-NITRIDE, Journal of materials research, 12(2), 1997, pp. 412-415
Citations number
13
Categorie Soggetti
Material Science
Journal title
Journal of materials research → ACNP
ISSN journal
08842914
Volume
12
Issue
2
Year of publication
1997
Pages
412 - 415
Database
ISI
SICI code
0884-2914(1997)12:2<412:SCEOHB>2.0.ZU;2-L
Abstract
A BN film containing comparable amounts of sp(2) and sp(3) phases was subjected to a gas-phase chemical etch in a hot-filament environment c ontaining 1% CH4 in H-2. After a partial etch, examination by FTIR sho ws that the sp(2) was preferentially etched, leaving a larger sp(3) fr action than in the unetched film. The possibility that preferential et ching could be used to increase the purity of cBN films is discussed.