MOCVD OF HIGH-QUALITY YBA2CU3O7-DELTA THIN-FILMS USING NOVEL FLUORINATED AND NON-FLUORINATED PRECURSORS

The first high quality, YBa2Cu3O7-delta thin films have been produced by MOCVD using the novel fluorinated and non-fluorinated precursors, [ Ba(TDFND)(2).tetraglyme](1), [Cu(TDFND)(2)] and [Y(TMHD)(3).4-(t)BuPyN O](2) and the traditional beta-diketonate complexes [Y(TMHD)(3)](3) an d [Cu(TMHD)(2)]. The novel precursors are thermally stable and highly volatile. Their low melting points, less than or equal to 100 degrees C, offer the advantage that they are liquid at the temperature of use. The removal of fluorine is effected by in situ water treatment. For f ilms deposited on SrTiO3 the composition and surface morphology has be en shown to be uniform over a 20 mm radius. The c axis orientation of the films has been confirmed by X-ray Diffraction and Rocking Curve An alysis. AC susceptibility has been used to show typical films possess a critical temperature, T-c > 90 K and critical current density, J(c) > 10(6) Acm(-2) at 77K. Fluorine content similar to 100 ppm has been d etermined by SIMS.