STRUCTURE AND DESTRUCTION OF A PRECURSOR - MASS-SPECTROMETRIC EVALUATION OF CREATION OF FUNCTIONAL FILMS WITH PREDETERMINATED COMPOSITION

Among a variety of applications of oganometallic compounds, their use as MOCVD precursors is one of the most extensive areas. To our minds, one of the most powerful and accurate methods for evaluation and predi ction of thermal behaviour of the precursor is mass-spectrometry coupl ed with mass-analyzed ion kinetic energy spectrometry. Traditionally, both structure and composition of deposited materials and the precurso r's thermal decomposition channels were controlled by gas-phase compos ition, the process temperature and pressure, i.e. by external factors. A possibility of such a control via inner factors - i.e. structure of a specially designed precursors is demonstrated for a series of new m ixed-ligand organometallic compounds of In, Zr and Hf.