CURRENT RATIO CONTROLLER CRC2 FOR ELECTRODEPOSITION

For the quasicontinuous potentiostatic electrodeposition of compound s emiconductors, up to four injection anodes of different and differentl y changing resistances were used simultaneously. The design of an auto matic current control unit to keep the relative anodic currents consta nt is shown. To allow for dynamic adjustment of the working potential, a ramp generator is added. The all-in-one design facilitates complete ly oscillation-free operation. (C) 1995 American Institute of Physics.