Electron mobilities have been measured in vapor-deposited layers of nz
o[k,1]thioxanthene-3,4-dicarboximide-7,7-dioxide (BTDD) and dimethylpr
opyl)-1,4,5,8-naphthalenetetracarboxylic diimide (NTDI). BTDD is a hig
hly polar acceptor molecule that incorporates both an imide and a sulf
one electronegative functionality. NTDI is a weakly polar acceptor mol
ecule that contains two imide functionalities. The results are describ
ed by a formalism based on disorder, due to Bassler and coworkers. The
formalism is based on the assumption that transport occurs by hopping
through a manifold of localized states that are distributed in energy
. The key parameter of the formalism is sigma, the energy width of the
hopping site manifold. The width is described by a model based on dip
olar disorder. The model is premised on the argument that the width is
comprised of a dipolar component sigma(d) and a van der Waals compone
nt a,dw. Describing the dipolar component by an expression due to Youn
g yields sigma(d) = 0.133eV for BTDD and 0.009eV for NTDI. The van der
Waals component for both molecules is 0.092 eV. The difference in the
dipolar component is the principal reason for the large difference in
mobility of these molecules.